4 Patents
- US117422452023Semiconductor Fabrication Method and Structure Using Multiple Sacrificial Layers to Form Sidewall Spacers
Semiconductor Manufacturing International (Beijing) Corporation
0 cites - US117283782023Semiconductor Device and Method for Manufacturing Same
Semiconductor Manufacturing International (Shanghai) Corporation
0 cites - US116371932023Gate-all-around Field Effect Transistor and Method for Manufacturing Same
SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION
0 cites - 0 cites