Patents/Inventors

Po-cheng Shih

Hsin ChiuTW14 patents

14 Patents

US125640282026
Dielectric Layers Having Nitrogen-containing Crusted Surfaces
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd
0 cites
US124244382025
Low-k Dielectric and Processes for Forming Same
Taiwan Semiconductor Manufacturing Co., Ltd.
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US124179482025
Hybrid Film Scheme for Self-aligned Contact
Taiwan Semiconductor Manufacturing Co., Ltd.
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US123879742025
Patterning Interconnects and Other Structures by Photo-sensitizing Method
Taiwan Semiconductor Manufacturing Co., Ltd.
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US123226472025
Semiconductor Devices and Methods
Taiwan Semiconductor Manufacturing Co., Ltd.
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US123025952025
Dummy Hybrid Film for Self-alignment Contact Formation
Taiwan Semiconductor Manufacturing Co., Ltd.
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US121989792025
Semiconductor Device with Multi-layer Etch Stop Structure
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites
US121661282024
Multi-layer Film Device and Method
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
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US121486962024
Methods for Reducing Dual Damascene Distortion
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
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US120626132024
Semiconductor Device Having an Extra Low-k Dielectric Layer and Method of Forming the Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
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US120338902024
Patterning Interconnects and Other Structures by Photo-sensitizing Method
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites
US118482312023
Method for Forming Semiconductor Device with Multi-layer Etch Stop Structure
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites
US117770352023
Multi-layer Film Device and Method
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd
0 cites
US116768552023
Patterning Interconnects and Other Structures by Photo-sensitizing Method
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites