Patents/Inventors

Philip Allan Kraus

San Jose, CAUS24 patents

25 Patents

US124379792025
Capacitive Sensors and Capacitive Sensing Locations for Plasma Chamber Condition Monitoring
Applied Materials, Inc.
0 cites
US124380052025
Low Temperature Selective Etching of Silicon Nitride Using Microwave Plasma
Applied Materials, Inc.
0 cites
US124068372025
Reaction Cell for Species Sensing
Applied Materials, Inc.
0 cites
US123409782025
Symmetric and Irregular Shaped Plasmas Using Modular Microwave Sources
Applied Materials, Inc.
0 cites
US123004972025
Method and Apparatus of Low Temperature Plasma Enhanced Chemical Vapor Deposition of Graphene
Applied Materials, Inc.
0 cites
US122285342025
Capacitive Sensor for Monitoring Gas Concentration
Applied Materials, Inc.
0 cites
US122160152025
MEMS Resonator Sensor Substrate for Plasma, Temperature, Stress, or Deposition Sensing
Applied Materials, Inc.
0 cites
US121989662025
Substrate Support with Multiple Embedded Electrodes
Applied Materials, Inc.
0 cites
US121911182025
Monolithic Modular Microwave Source with Integrated Process Gas Distribution
Applied Materials, Inc.
0 cites
US121440902024
Monolithic Modular Microwave Source with Integrated Temperature Control
Applied Materials, Inc.
0 cites
US120947072024
Plasma Enhanced CVD with Periodic High Voltage Bias
Applied Materials, Inc.
0 cites
US120338352024
Modular Microwave Source with Multiple Metal Housings
Applied Materials, Inc.
0 cites
US120126522024
Single Process Volume to Perform High-pressure and Low-pressure Processes with Features to Reduce Cross-contamination
Applied Materials, Inc.
0 cites
US120092362024
Sensors and System for In-situ Edge Ring Erosion Monitor
Applied Materials, Inc.
0 cites
US120026542024
Modular High-frequency Source
Applied Materials, Inc.
0 cites
US119598682024
Capacitive Sensor for Monitoring Gas Concentration
Applied Materials, Inc.
0 cites
US119553312024
Method of Forming Silicon Nitride Films Using Microwave Plasma
Applied Materials, Inc.
0 cites
US118813842024
Monolithic Modular Microwave Source with Integrated Process Gas Distribution
Applied Materials, Inc.
0 cites
US118741892024
MEMS Resonator Sensor Substrate for Plasma, Temperature, Stress, or Deposition Sensing
Applied Materials, Inc.
0 cites
US117215322023
Modular Microwave Source with Local Lorentz Force
Applied Materials, Inc.
0 cites
US116918722023
Pore Formation in a Substrate
Applied Materials, Inc.
0 cites
US116704892023
Modular Microwave Source with Embedded Ground Surface
Applied Materials, Inc.
0 cites
US115812062023
Capacitive Sensor for Chamber Condition Monitoring
Applied Materials, Inc.
0 cites
US115642922023
Monolithic Modular Microwave Source with Integrated Temperature Control
Applied Materials, Inc.
0 cites
US115519052023
Resonant Process Monitor
Intel Corporation
0 cites