Peter F. Kurunczi

13 Patents

• US125975882026

  Inductively Coupled Plasma Apparatus with Novel Faraday Shield

  Applied Materials, Inc.

  0 cites
• US125735792026

  Hybrid Apparatus, System and Techniques for Mass Analyzed Ion Beam

  Applied Materials, Inc.

  0 cites
• US122494882025

  Plasma Shaper to Control Ion Flux Distribution of Plasma Source

  Applied Materials, Inc.

  0 cites
• US121911562025

  Ribbon Beam Plasma Enhanced Chemical Vapor Deposition System for Anisotropic Deposition of Thin Films

  Applied Materials, Inc.

  0 cites
• US121547532024

  Device to Control Uniformity of Extracted Ion Beam

  Applied Materials, Inc.

  0 cites
• US121069362024

  Scanned Angled Etching Apparatus and Techniques Providing Separate Co-linear Radicals and Ions

  Applied Materials, Inc.

  0 cites
• US119962662024

  Apparatus and Techniques for Substrate Processing Using Independent Ion Source and Radical Source

  Applied Materials, Inc.

  0 cites
• US119674892024

  Apparatus and Techniques for Angled Etching Using Multielectrode Extraction Source

  Applied Materials, Inc.

  0 cites
• US119487812024

  Apparatus and System Including High Angle Extraction Optics

  Applied Materials, Inc.

  0 cites
• US118624332024

  System and Methods Using an Inline Surface Engineering Source

  Varlan Semiconductor Equipment Associates, Inc.

  0 cites
• US118107462023

  Variable Thickness Ion Source Extraction Plate

  Applied Materials, Inc.

  0 cites
• US117156212023

  Scanned Angled Etching Apparatus and Techniques Providing Separate Co-linear Radicals and Ions

  APPLIED Materials, Inc.

  0 cites
• US115877782023

  Electrodynamic Mass Analysis with RF Biased Ion Source

  Applied Materials, Inc.

  0 cites