Peter De Schepper

7 Patents

• US125663772026

  Multiple Patterning with Organometallic Photopatternable Layers with Intermediate Freeze Steps

  Inpria Corporation

  0 cites
• US124986412025

  Process Environment for Inorganic Resist Patterning

  Tokyo Electron Limited

  0 cites
• US123994262025

  Patterned Organometallic Photoresists and Methods of Patterning

  Inpria Corporation

  0 cites
• US123604542025

  Stabilized Interfaces of Inorganic Radiation Patterning Compositions on Substrates

  Inpria Corporation

  0 cites
• US120726262024

  Organometallic Radiation Patternable Coatings with Low Defectivity and Corresponding Methods

  Inpria Corporation

  0 cites
• US119472622024

  Process Environment for Inorganic Resist Patterning

  Inpria Corporation

  0 cites
• US118861162024

  Multiple Patterning with Organometallic Photopatternable Layers with Intermediate Freeze Steps

  Inpria Corporation

  0 cites