5 Patents
- US120949362024Methods for Forming a Metal Silicate Film on a Substrate in a Reaction Chamber and Related Semiconductor Device Structures
ASM IP Holding B.V.
0 cites - US120209382024Method of Forming an Electrode on a Substrate and a Semiconductor Device Structure Including an Electrode
ASM IP Holding B.V.
0 cites - US119293142024Interconnect Structures Including a Fin Structure and a Metal Cap
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US119231922024Methods for Depositing an Oxide Film on a Substrate by a Cyclical Deposition Process and Related Device Structures
ASM IP Holding B.V.
0 cites - US117989992023Methods for Forming a Metal Silicate Film on a Substrate in a Reaction Chamber and Related Semiconductor Device Structures
ASM IP Holding B.V.
0 cites