Patrick Wilke

2 Patents

• US121461252024

  Use of Compositions Comprising a Solvent Mixture for Avoiding Pattern Collapse When Treating Patterned Materials with Line-space Dimensions of 50 Nm or Below

  BASF SE

  0 cites
• US119706472024

  Composition, Its Use and a Process for Selectively Etching Silicon-germanium Material

  BASF SE

  0 cites