Patents/Inventors

Patrick Warnaar

TilburgNL16 patents

15 Patents

US124932472025
Method and System for Predicting Process Information with a Parameterized Model
ASML Netherlands B.V.
0 cites
US124614512025
Computational Metrology
ASML NETHERLANDS B.V.
0 cites
US124055352025
Method for Filtering an Image and Associated Metrology Apparatus
ASML Netherlands B.V.
0 cites
US123668112025
Metrology System and Method for Determining a Characteristic of One or More Structures on a Substrate
ASML Netherlands B.V.
0 cites
US122422032025
Target for Measuring a Parameter of a Lithographic Process
ASML Netherlands B.V.
0 cites
US121971362025
Method of Determining Control Parameters of a Device Manufacturing Process
ASML NETHERLANDS B.V.
0 cites
US121122602024
Metrology Apparatus and Method for Determining a Characteristic of One or More Structures on a Substrate
ASML Netherlands B.V.
0 cites
US121054322024
Metrology Method and Associated Computer Product
ASML Netherlands B.V.
0 cites
US120667642024
Metrology Apparatus and Method for Determining a Characteristic of One or More Structures on a Substrate
ASML Netherlands B.V.
0 cites
US120193772024
Target for Measuring a Parameter of a Lithographic Process
ASML Netherlands B.V.
0 cites
US120077002024
Metrology System and Method for Determining a Characteristic of One or More Structures on a Substrate
ASML Netherlands B.V.
0 cites
US119829462024
Metrology Targets
ASML HOLDING N.V.
0 cites
US117684422023
Method of Determining Control Parameters of a Device Manufacturing Process
ASML NETHERLANDS B.V.
0 cites
US117094362023
Metrology Apparatus and Method for Determining a Characteristic of One or More Structures on a Substrate
ASML Netherlands B.V.
0 cites
US116500472023
Metrology Apparatus and Method for Determining a Characteristic of One or More Structures on a Substrate
ASML Netherlands B.V.
0 cites