13 Patents
- US125720662026Extreme Ultraviolet Source Temperature Monitoring Using Confocal Sensor
KLA Corporation
0 cites - US124696862025Process Characterization and Correction Using Optical Wall Process Sensor (OWPS)
Applied Materials, Inc.
0 cites - US124427652025Transmission Corrected Plasma Emission Using In-situ Optical Reflectometry
Applied Materials, Inc.
0 cites - 0 cites
- 0 cites
- US121230902024Differential Capacitive Sensor for In-situ Film Thickness and Dielectric Constant Measurement
APPLIED MATERIALS, Inc.
0 cites - 0 cites
- US120319102024Transmission Corrected Plasma Emission Using In-situ Optical Reflectometry
Applied Materials, Inc.
0 cites - US120091912024Thin Film, In-situ Measurement Through Transparent Crystal and Transparent Substrate Within Processing Chamber Wall
Applied Materials, Inc.
0 cites - US120000412024Processing Chamber Condition and Process State Monitoring Using Optical Reflector Attached to Processing Chamber Liner
Applied Materials, Inc.
0 cites - US117812142023Differential Capacitive Sensors for In-situ Film Thickness and Dielectric Constant Measurement
APPLIED MATERIALS, Inc.
0 cites - 0 cites
- US117086352023Processing Chamber Condition and Process State Monitoring Using Optical Reflector Attached to Processing Chamber Liner
Applied Materials, Inc.
0 cites