Patents/Inventors

Parham Yaghoobi

EindhovenNL1 patent

2 Patents

US123325702025
Lithographic System Provided with a Deflection Apparatus for Changing a Trajectory of Particulate Debris
ASML Netherlands B.V.
0 cites
US118468872023
Prolonging Optical Element Lifetime in an EUV Lithography System
ASML Netherlands B.V.
0 cites