Patents/Inventors

Osamu Nozawa

TokyoJP9 patents

9 Patents

US126134632026
Mask Blank, and Phase Shift Mask
HOYA CORPORATION
0 cites
US125299532026
Mask Blank, Phase Shift Mask, and Method of Manufacturing Semiconductor Device
HOYA CORPORATION
0 cites
US124682172025
Mask Blank, Method of Manufacturing Transfer Mask, and Method of Manufacturing Semiconductor Device
HOYA CORPORATION
0 cites
US124114022025
Reflective Mask Blank, Reflective Mask, and Method for Manufacturing Semiconductor Device
HOYA CORPORATION
0 cites
US121533382024
Mask Blank, Method for Manufacturing Transfer Mask, and Method for Manufacturing Semiconductor Device
HOYA CORPORATION
0 cites
US120076842024
Mask Blank, Method of Manufacturing Imprint Mold, Method of Manufacturing Transfer Mask, Method of Manufacturing Reflective Mask, and Method of Manufacturing Semiconductor Device
HOYA CORPORATION
0 cites
US117622792023
Mask Blank, Method for Manufacturing Reflective Mask, and Method for Manufacturing Semiconductor Device
HOYA CORPORATION
0 cites
US117200142023
Mask Blank, Phase Shift Mask, and Method of Manufacturing Semiconductor Device
HOYA CORPORATION
0 cites
US116303882023
Mask Blank, Method for Manufacturing Phase Shift Mask, and Method for Manufacturing Semiconductor Device
HOYA CORPORATION
0 cites