Patents/Inventors

Olger Victor Zwier

EindhovenNL4 patents

5 Patents

US122769212025
Substrate Comprising a Target Arrangement, and Associated at Least One Patterning Device, Lithographic Method and Metrology Method
ASML Netherlands B.V.
0 cites
US122422032025
Target for Measuring a Parameter of a Lithographic Process
ASML Netherlands B.V.
0 cites
US120193772024
Target for Measuring a Parameter of a Lithographic Process
ASML Netherlands B.V.
0 cites
US120136472024
Metrology Method
ASML NETHERLANDS B.V.
0 cites
US119829462024
Metrology Targets
ASML HOLDING N.V.
0 cites