Nobutaka Takahashi

2 Patents

• US125710992026

  Bis(ethylcyclopentadienyl)tin, Precursor for Chemical Vapor Deposition, Method of Producing Tin-containing Thin Film, and Method of Producing Tin Oxide Thin Film

  KOJUNDO CHEMICAL LABORATORY CO., Ltd.

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• US124105142025

  Vapor Deposition Source Material Used in Production of Film Containing Indium and One or More of the Other Metals, and the Method of Producing Film Containing Indium and One or More of the Other Metals

  KOJUNDO CHEMICAL LABORATORY CO., Ltd.

  0 cites