10 Patents
- US125312112026Sulfur-containing Molecules for High Aspect Ratio Plasma Etching Processes
L'air Liquide, Société Anonyme Pour L'etude Et L'exploitation Des Procédés Georges Claude
0 cites - US123410172025Etching Methods with Alternating Non-plasma and Plasma Etching Processes
American Air Liquide, Inc.
0 cites - US123277312025Etching Gas Mixture and Method of Manufacturing Integrated Circuit Device Using the Same
L'air Liquide Société Anonyme Pour L'etude Et L'exploitation Des Procédés Georges Claude
0 cites - US123277322025Method to Improve Profile Control During Selective Etching of Silicon Nitride Spacers
American Air Liquide, Inc.
0 cites - US122241772025Method of Running an Etch Process in Higher Selectivity to Mask and Polymer Regime by Using a Cyclic Etch Process
American Air Liquide, Inc.
0 cites - 0 cites
- US121069402024Systems and Methods for Storage and Supply of F3no-free FNO Gases and F3no-free FNO Gas Mixtures for Semiconductor Processes
L'air Liquide, Société Anonyme Pour L'etude Et L'exploitation Des Procédés Georges Claude
0 cites - US121069712024High Conductive Passivation Layers and Method of Forming the Same During High Aspect Ratio Plasma Etching
American Air Liquide, Inc.
0 cites - US120834932024Selective Adsorption of Halocarbon Impurities Containing Cl, Br and I in Fluorocarbons or Hydrofluorocarbons Using Adsorbent Supported Metal Oxide
American Air Liquide, Inc.
0 cites - US118374742023Method to Improve Profile Control During Selective Etching of Silicon Nitride Spacers
American Air Liquide, Inc.
0 cites