Naoya Shimoju

7 Patents

• US124974692025

  Composition for Forming Pattern, Kit, Pattern Producing Method, Pattern, and Method for Manufacturing Semiconductor Element

  FUJIFILM Corporation

  0 cites
• US124213432025

  Composition for Forming Underlayer Film for Imprinting, Method for Producing Composition for Forming Underlayer Film, Kit, Pattern Producing Method, and Method for Manufacturing Semiconductor Element

  FUJIFILM Corporation

  0 cites
• US123796582025

  Curable Composition for Imprinting, Method for Producing Curable Composition for Imprinting, Cured Product, Pattern Producing Method, and Method for Manufacturing Semiconductor Element

  FUJIFILM Corporation

  0 cites
• US122421852025

  Curable Composition, Kit, Interlayer, Laminate, Imprint Pattern Producing Method, and Method for Manufacturing Device

  FUJIFILM Corporation

  0 cites
• US121097522024

  Composition for Forming Underlayer Film in Imprinting Method, Kit, Pattern Producing Method, Laminate, and Method for Manufacturing Semiconductor Element

  FUJIFILM Corporation

  0 cites
• US118993612024

  Kit, Composition for Forming Underlayer Film for Imprinting, Laminate, and Production Method Using the Same

  FUJIFILM Corporation

  0 cites
• US117106412023

  Kit, Composition for Forming Underlayer Film for Imprinting, Pattern Forming Method, and Method for Manufacturing Semiconductor Device

  FUJIFILM Corporation

  0 cites