Patents/Inventors

Naomi Yoshida

Sunnyvale, CAUS10 patents

9 Patents

US125923692026
Integrated Method and Tool for High Quality Selective Silicon Nitride Deposition
Applied Materials, Inc.
0 cites
US125435472026
Method of Dielectric Material Fill and Treatment
Applied Materials Inc.
0 cites
US120625452024
Fluorine-free Tungsten ALD for Dielectric Selectivity Improvement
Applied Materials, Inc.
0 cites
US120465082024
Method of Dielectric Material Fill and Treatment
APPLIED MATERIALS, Inc.
0 cites
US118942332024
Electronic Device Having an Oxygen Free Platinum Group Metal Film
Applied Materials, Inc.
0 cites
US118880452024
Integrated Dipole Flow for Transistor
Applied Materials, Inc.
0 cites
US118483692023
Horizontal Gate-all-around Device Nanowire Air Gap Spacer Formation
APPLIED MATERIALS, Inc.
0 cites
US118307252023
Method of Cleaning a Structure and Method of Depositing a Capping Layer in a Structure
Applied Materials, Inc.
0 cites
US116159842023
Method of Dielectric Material Fill and Treatment
APPLIED MATERIALS, Inc.
0 cites