Patents/Inventors

Naohiko Okunishi

MiyagiJP5 patents

6 Patents

US123343092025
Filter Device and Plasma Processing Apparatus
TOKYO ELECTRON LIMITED
0 cites
US122223622025
Method of Measuring Parameters of Plasma, Apparatus for Measuring Parameters of Plasma, Plasma Processing System, and Method of Processing Wafer
SAMSUNG ELECTRONICS CO., Ltd.
0 cites
US122100452025
Impedance Measurement Jig and Method of Controlling a Substrate-processing Apparatus Using the Jig
SAMSUNG ELECTRONICS CO., Ltd.
0 cites
US119086642024
Plasma Processing Apparatus
TOKYO ELECTRON LIMITED
0 cites
US116995762023
Filter Device and Plasma Processing Apparatus
TOKYO ELECTRON LIMITED
0 cites
US116948812023
Stage and Plasma Processing Apparatus
TOKYO ELECTRON LIMITED
0 cites