4 Patents
- US125449582026Method of Making Low Specific Gravity Polishing Pads
Rohm And Haas Electronic Materials CMP Holdings, Inc.
0 cites - US125281522026CMP Pad Having Ultra Expanded Polymer Microspheres
Rohm And Haas Electronic Materials CMP Holdings, Inc.
0 cites - US123840022025Composite Pad for Chemical Mechanical Polishing
Rohm And Haas Electronic Materials CMP Holdings, Inc.
0 cites - US116389782023Low-debris Fluopolymer Composite CMP Polishing Pad
Rohm And Haas Electronic Materials CMP Holdings, Inc.
0 cites