5 Patents
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- US124244122025Apparatus for Providing RF Power and Operating Method Thereof
Samsung Electronics Co., Ltd.
0 cites - US122223622025Method of Measuring Parameters of Plasma, Apparatus for Measuring Parameters of Plasma, Plasma Processing System, and Method of Processing Wafer
SAMSUNG ELECTRONICS CO., Ltd.
0 cites - US121835552024Substrate Processing Apparatus and Method of Manufacturing Semiconductor Device Using the Same
SAMSUNG ELECTRONICS CO., Ltd.
0 cites - US119962752024Device for Radical Diagnostic in Plasma Processing Chamber, Radical Diagnostic System Having the Same, and Operating Method Thereof
Samsung Electronics Co., Ltd.
0 cites