18 Patents
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- US125605292026Imaging Ellipsometer and Method of Measuring an Overlay Error Using the Same
Samsung Electronics Co., Ltd.
0 cites - US125617882026Fluorescence Microscopy Metrology System and Method of Operating Fluorescence Microscopy Metrology System
IUCF-HYU (Industry-university Cooperation Foundation Hanyang University)
0 cites - US125354332026Focus Control Method for Spectroscopic Measuring Apparatus, Inspection Method for Semiconductor Device, and Spectroscopic Measuring Apparatus for Performing the Same
Samsung Electronics Co., Ltd.
0 cites - US124052262025Substrate Inspection Apparatus and Substrate Inspection Method
TRUSTEES OF BOSTON UNIVERSITY
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- US123076502025Scanning Electron Microscope Device, Semiconductor Manufacturing Device, and Method of Controlling Semiconductor Manufacturing Device
Samsung Electronics Co., Ltd.
0 cites - US122284992025Pupil Ellipsometry Measurement Apparatus and Method and Method of Fabricating Semiconductor Device Using the Pupil Ellipsometry Measurement Method
SAMSUNG ELECTRONICS CO., Ltd.
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- US120450092024Digital Holography Microscope (DHM), and Inspection Method and Semiconductor Manufacturing Method Using the DHM
SAMSUNG ELECTRONICS CO., Ltd.
0 cites - US120387182024Holographic Microscope and Manufacturing Method of Semiconductor Device Using the Same
SAMSUNG ELECTRONICS CO., Ltd.
0 cites - US120026982024Metrology Apparatus and Method Based on Diffraction Using Oblique Illumination and Method of Manufacturing Semiconductor Device Using the Metrology Method
SAMSUNG ELECTRONICS CO., Ltd.
0 cites - US119884952024Through-focus Image-based Metrology Device, Operation Method Thereof, and Computing Device for Executing the Operation
SAMSUNG ELECTRONICS CO., Ltd.
0 cites - US119729602024Imaging Ellipsometry (ie)-based Inspection Method and Method of Fabricating Semiconductor Device by Using Ie-based Inspection Method
SAMSUNG ELECTRONICS CO., Ltd.
0 cites - US117260462023Multi-scale Spectral Imaging Apparatuses and Methods, and Methods of Manufacturing Semiconductor Devices by Using the Imaging Methods
Samsung Electronics Co., Ltd.
0 cites - US116041362023Pupil Ellipsometry Measurement Apparatus and Method and Method of Fabricating Semiconductor Device Using the Pupil Ellipsometry Measurement Method
SAMSUNG ELECTRONICS CO., Ltd.
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