Muneyuki Omi

3 Patents

• US125639872026

  Plasma Processing Method and Plasma Processing System

  TOKYO ELECTRON LIMITED

  0 cites
• US125487442026

  Plasma Processing Apparatus, Control Method, and Storage Medium for Suppressing Deterioration Effects from Wear of an Edge Ring

  TOKYO ELECTRON LIMITED

  0 cites
• US116315902023

  Substrate Processing Method, Substrate Processing Apparatus and Cleaning Apparatus

  TOKYO ELECTRON LIMITED

  0 cites