Patents/Inventors

Munehito Kagaya

YamanashiJP14 patents

10 Patents

US126181562026
Atomic Layer Deposition of Silicon Nitride Film Using Helium Gas Plasma
Tokyo Electron Limited
0 cites
US124826352025
Plasma Processing Device, and Plasma Processing Method
Tokyo Electron Limited
0 cites
US123745432025
Recess Filling Method and Substrate Processing Apparatus
TOKYO ELECTRON LIMITED
0 cites
US123449332025
Sin Film Embedding Method
TOKYO ELECTRON LIMITED
0 cites
US123314032025
Substrate Processing Method and Substrate Processing Device
Tokyo Electron Limited
0 cites
US123126832025
Substrate Processing Method and Substrate Processing Device
Tokyo Electron Limited
0 cites
US120209002024
Plasma Processing Device, and Plasma Processing Method
Tokyo Electron Limited
0 cites
US119962962024
Substrate Processing Method and Substrate Processing System
TOKYO ELECTRON LIMITED
0 cites
US116580082023
Film Forming Apparatus and Film Forming Method
Tokyo Electron Limited
0 cites
US116263302023
Film Forming Method and Film Forming Apparatus
Tokyo Electron Limited
0 cites