5 Patents
- 0 cites
- 0 cites
- 0 cites
- US116461972023Method for Depositing Silicon-free Carbon-containing Film as Gap-fill Layer by Pulse Plasma-assisted Deposition
ASM IP Holding B.V.
0 cites - US116263162023Method of Depositing Carbon-containing Material on a Surface of a Substrate, Structure Formed Using the Method, and System for Forming the Structure
ASM IP Holding B.V.
0 cites