7 Patents
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- US125639902026Densification and Reduction of Selectively Deposited Si Protective Layer for Mask Selectivity Improvement in HAR Etching
Tokyo Electron Limited
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- US124630482025Methods for Forming Semiconductor Devices Using Metal Hard Masks
Tokyo Electron Limited
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- US120401762024Technologies for High Aspect Ratio Carbon Etching with Inserted Charge Dissipation Layer
Tokyo Electron Limited
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