15 Patents
- US124462612025Multi-gate Devices and Method of Forming the Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - 0 cites
- US123962342025Method for Forming Semiconductor Device Structure with a Cap Layer
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US123896532025Semiconductor Devices and Methods of Fabricating the Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US123242182025Semiconductor Devices with Air Gaps and the Method Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US122782762025Multi-channel Devices and Method with Anti-punch Through Process
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US121913702025Semiconductor Device with Tunable Channel Layer Usage and Methods of Fabrication Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US121660712024Dielectric Fins with Air Gap and Backside Self-aligned Contact
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - 0 cites
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- US118376312023Source/drain Spacer with Air Gap in Semiconductor Devices and Methods of Fabricating the Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US118108272023Finfet Device with Different Liners for PFET and NFET and Method of Fabricating Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US116887672023Semiconductor Device Structure and Method for Forming the Same
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US116887682023Integrated Circuit Structure with Source/drain Spacers
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US116006952023Dielectric Fins with Air Gap and Backside Self-aligned Contact
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites