Min-chul Sun

5 Patents

• US122610872025

  Methods of Manufacturing Semiconductor Devices by Etching Active Fins Using Etching Masks and Forming Source/drain Layers on the Active Fins

  SAMSUNG ELECTRONICS CO., Ltd.

  0 cites
• US122612002025

  Semiconductor Device Including Isolation Regions

  SAMSUNG ELECTRONICS CO., Ltd.

  0 cites
• US118307752023

  Methods of Manufacturing Semiconductor Devices by Etching Active Fins Using Etching Masks

  SAMSUNG ELECTRONICS CO., Ltd.

  0 cites
• US118309112023

  Semiconductor Device Including Isolation Regions

  Samsung Electronics Co., Ltd.

  0 cites
• US115750022023

  Semiconductor Device Including Isolation Regions

  Samsung Electronics Co., Ltd.

  0 cites