Patents/Inventors

Mikio Sato

OsakaJP16 patents

15 Patents

US125815932026
Prepreg, and Metal-clad Laminated Board and Wiring Substrate Obtained Using Same
PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., Ltd.
0 cites
US122437182025
Plasma Processing Method and Plasma Processing Apparatus
Tokyo Electron Limited
0 cites
US122336212025
Copper-clad Laminated Plate, Resin-clad Copper Foil, and Circuit Substrate Using Said Plate and Foil
PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., Ltd.
0 cites
US122371572025
Plasma Measurement Method
Tokyo Electron Limited
0 cites
US120245902024
Resin Composition, Prepreg, Film with Resin, Metal Foil with Resin, Metal-clad Laminate, and Wiring Board
PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., Ltd.
0 cites
US120226112024
Prepreg, Metal-clad Laminate, and Wiring Board
PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., Ltd.
0 cites
US119674852024
Plasma Processing Apparatus and Plasma Processing Method
TOKYO ELECTRON LIMITED
0 cites
US119016552024
Pin Terminal, Connector, Wiring Harness with Connector and Control Unit
SUMITOMO ELECTRIC INDUSTRIES, Ltd.
0 cites
US118878252024
Control Method and Plasma Processing Apparatus
TOKYO ELECTRON LIMITED
0 cites
US118665362024
Copper-clad Laminate Plate, Resin-attached Copper Foil, and Circuit Board Using Same
PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., Ltd.
0 cites
US118201052023
Prepreg, Metal-clad Laminate, and Wiring Board
PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., Ltd.
0 cites
US117495112023
Plasma Observation System and Plasma Observation Method
TOKYO ELECTRON LIMITED
0 cites
US117215282023
Plasma Processing Apparatus and Control Method
TOKYO ELECTRON LIMITED
0 cites
US117053102023
Plasma Probe Device, Plasma Processing Apparatus, and Control Method
TOKYO ELECTRON LIMITED
0 cites
US116004752023
Plasma Processing Apparatus and Control Method
TOKYO ELECTRON LIMITED
0 cites