Patents/Inventors

Michihiro Shirakawa

Haibara-gunJP13 patents

13 Patents

US126134662026
Actinic Ray-sensitive or Radiation-sensitive Resin Composition, Resist Film, Pattern Forming Method, and Method for Manufacturing Electronic Device
FUJIFILM Corporation
0 cites
US125541962026
Actinic Ray-sensitive or Radiation-sensitive Resin Composition, Pattern Forming Method, Resist Film, Method for Manufacturing Electronic Device, Compound, and Method for Producing Compound
FUJIFILM Corporation
0 cites
US124812152025
Active-light-sensitive or Radiation-sensitive Resin Composition, Resist Film, Pattern Formation Method, Method for Manufacturing Electronic Device, Compound, and Resin
FUJIFILM Corporation
0 cites
US124227522025
Actinic Ray-sensitive or Radiation-sensitive Resin Composition, Resist Film, Pattern Forming Method, and Method for Manufacturing Electronic Device
FUJIFILM Corporation
0 cites
US120449672024
Actinic-ray-sensitive or Radiation-sensitive Resin Composition, Resist Film, Pattern Formation Method, and Method for Manufacturing Electronic Device
FUJIFILM Corporation
0 cites
US120322902024
Actinic Ray-sensitive or Radiation-sensitive Resin Composition, Resist Film, Pattern Forming Method, and Method for Manufacturing Electronic Device
FUJIFILM Corporation
0 cites
US119538292024
Actinic Ray-sensitive or Radiation-sensitive Resin Composition, Resist Film, Pattern Forming Method, and Method for Manufacturing Electronic Device
FUJIFILM Corporation
0 cites
US118861132024
Actinic Ray-sensitive or Radiation-sensitive Resin Composition, Resist Film, Pattern Forming Method, and Method for Manufacturing Electronic Device
FUJIFILM Corporation
0 cites
US117037582023
Photosensitive Composition for EUV Light, Pattern Forming Method, and Method for Manufacturing Electronic Device
FUJIFILM Corporation
0 cites
US116565482023
Actinic Ray-sensitive or Radiation-sensitive Resin Composition, Resist Film, Pattern Forming Method, Mask Blank with Resist Film, Method for Producing Photomask, and Method for Manufacturing Electronic Device
FUJIFILM Corporation
0 cites
US116044142023
Photosensitive Composition for EUV Light, Pattern Forming Method, and Method for Manufacturing Electronic Device
FUJIFILM Corporation
0 cites
US115848102023
Actinic Ray-sensitive or Radiation-sensitive Resin Composition, Actinic Ray-sensitive or Radiation-sensitive Film, Pattern Forming Method, Method of Manufacturing Electronic Device, Compound, and Resin
FUJIFILM Corporation
0 cites
US115734912023
Negative Tone Photosensitive Composition for EUV Light, Pattern Forming Method, and Method for Manufacturing Electronic Device
FUJIFILM Corporation
0 cites