Michael Patra

3 Patents

• US125851932026

  Optical System for a Lithographic Projection Exposure Apparatus

  Carl Zeiss SMT GmbH

  0 cites
• US123395892025

  Digital Micromirror Device for an Illumination Optical Component of a Projection Exposure System

  Carl Zeiss SMT GmbH

  0 cites
• US117200282023

  Measurement Illumination Optical Unit for Guiding Illumination Light Into an Object Field of a Projection Exposure System for EUV Lithography

  Carl Zeiss SMT GmbH

  0 cites