5 Patents
- US123840022025Composite Pad for Chemical Mechanical Polishing
Rohm And Haas Electronic Materials CMP Holdings, Inc.
0 cites - US122207842025Chemical Mechanical Polishing Pad and Preparation Thereof
Rohm And Haas Electronic Materials CMP Holdings, Inc.
0 cites - US120648462024Formulations for High Porosity Chemical Mechanical Polishing Pads with High Hardness and CMP Pads Made Therewith
Rohm And Haas Electronic Materials CMP Holdings, Inc.
0 cites - 0 cites
- US116338302023CMP Polishing Pad with Uniform Window
Rohm And Haas Electronic Materials CMP Holdings, Inc.
0 cites