Patents/Inventors

Medhat A. Toukhy

Flemington, NJUS2 patents

3 Patents

US122769092025
Novolak/dnq Based, Chemically Amplified Photoresist
Merck Patent GmbH
0 cites
US121241662024
Negative Resist Formulation for Producing Undercut Pattern Profiles
Merck Patent GmbH
0 cites
US118222422023
Dnq-type Photoresist Composition Including Alkali-soluble Acrylic Resins
Merck Patent GmbH
0 cites