Maurilio Meschia

4 Patents

• US124354202025

  Reaction Chamber for an Epitaxial Reactor of Semiconductor Material with Non-uniform Longitudinal Section and Reactor

  LPE S.P.A.

  0 cites
• US123717792025

  Reaction Chamber Comprising a Rotating Element for the Deposition of a Semiconductor Material

  DENSO CORPORATION

  0 cites
• US123314232025

  Reaction Chamber for a Deposition Reactor with Interspace and Lower Closing Element and Reactor

  DENSO CORPORATION

  0 cites
• US121958772025

  Substrate Support Device for a Reaction Chamber of an Epitaxial Reactor with Gas Flow Rotation, Reaction Chamber and Epitaxial Reactor

  LPE S.P.A.

  0 cites