Masayuki Shiina

2 Patents

• US122207122025

  Centrifuge That Adjusts the Amount of Supernatant Liquid That Is Discharged

  Eppendorf Himac Technologies Co., Ltd.

  0 cites
• US120946872024

  Plasma Processing Apparatus and Plasma Processing Method

  HITACHI HIGH-TECH CORPORATION

  0 cites