Patents/Inventors

Masato Shinada

TokyoJP13 patents

13 Patents

US125312192026
Substrate Processing Apparatus and Cleaning Method
Tokyo Electron Limited
0 cites
US124630222025
Placing Table and Substrate Processing Apparatus
Tokyo Electron Limited
0 cites
US124379762025
Substrate Processing Apparatus
Tokyo Electron Limited
0 cites
US123157072025
Mounting Table Structure, Substrate Processing Apparatus, and Method of Controlling Substrate Processing Apparatus
Tokyo Electron Limited
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US122610782025
Processing Method and Processing Apparatus
Tokyo Electron Limited
0 cites
US120026672024
Sputtering Apparatus and Method of Controlling Sputtering Apparatus
Tokyo Electron Limited
0 cites
US119396652024
Film Thickness Measuring Apparatus and Film Thickness Measuring Method, and Film Forming System and Film Forming Method
TOKYO ELECTRON LIMTED
0 cites
US118517502023
Apparatus and Method for Performing Sputtering Process
Tokyo Electron Limited
0 cites
US118238792023
Film Formation Apparatus and Film Formation Method
Tokyo Electron Limited
0 cites
US117421902023
Sputtering Apparatus and Film Forming Method
Tokyo Electron Limited
0 cites
US116642072023
Film-forming Apparatus, Film-forming System, and Film-forming Method
TOKYO ELECTRON LIMITED
0 cites
US115811712023
Cathode Unit and Film Forming Apparatus
TOKYO ELECTRON LIMITED
0 cites
US115425922023
Film Forming System and Method for Forming Film on Substrate
TOKYO ELECTRON LIMITED
0 cites