Patents/Inventors

Masanobu Honda

MiyagiJP18 patents

18 Patents

US125819212026
Multiple Patterning with Selective Mandrel Formation
TOKYO ELECTRON LIMITED
0 cites
US125326812026
Etching Method and Plasma Processing System
TOKYO ELECTRON LIMITED
0 cites
US125326832026
Apparatus for Substrate Processing
TOKYO ELECTRON LIMITED
0 cites
US124826512025
Substrate Processing Method and Substrate Processing Apparatus
TOKYO ELECTRON LIMITED
0 cites
US124761152025
Method for Processing Workpiece
TOKYO ELECTRON LIMITED
0 cites
US124566282025
Substrate Processing Method and Substrate Processing Apparatus
Tokyo Electron Limited
0 cites
US124127502025
Plasma Processing Method and Plasma Processing Apparatus
TOKYO ELECTRON LIMITED
0 cites
US123343432025
Substrate Processing Method and Substrate Processing System
TOKYO ELECTRON LIMITED
0 cites
US122305052025
Etching Apparatus
TOKYO ELECTRON LIMITED
0 cites
US121129542024
Etching Method, Substrate Processing Apparatus, and Substrate Processing System
TOKYO ELECTRON LIMITED
0 cites
US120716872024
Plasma Processing Method and Plasma Processing Apparatus
TOKYO ELECTRON LIMITED
0 cites
US119553372024
Substrate Processing Method and Substrate Processing System
TOKYO ELECTRON LIMITED
0 cites
US119223072024
Learning Device, Inference Device, and Learned Model
Tokyo Electron Limited
0 cites
US117281762023
Treatment Method
Tokyo Electron Limited
0 cites
US116996142023
Film Deposition Method and Plasma Processing Apparatus
Tokyo Electron Limited
0 cites
US116519712023
Etching Method, Substrate Processing Apparatus, and Substrate Processing System
MAX CO., Ltd.
0 cites
US115944222023
Film Etching Method for Etching Film
TOKYO ELECTRON LIMITED
0 cites
US115453552023
Substrate Processing Method and Substrate Processing Apparatus
TOKYO ELECTRON LIMITED
0 cites