Masami Mesuda

11 Patents

• US125575672026

  Laminated Film, Structure Including Laminated Film, Semiconductor Element, Electronic Device, and Method for Producing Laminated Film

  TOSOH CORPORATION

  0 cites
• US125287112026

  Powder of Gallium Nitride and Method for Producing the Same

  TOSOH CORPORATION

  0 cites
• US124101012025

  Gallium Nitride-based Sintered Body and Method for Manufacturing Same

  TOSOH CORPORATION

  0 cites
• US123920252025

  Method for Producing Chromium Sintered Body, Method for Producing Sputtering Target, and Method for Producing Substrate with Chromium Film

  TOSOH SPECIALITY MATERIALS CORPORATION

  0 cites
• US123851262025

  Sputtering Target, Method for Producing Same, and Method for Producing Sputtering Film Using Sputtering Target

  TOSOH SPECIALITY MATERIALS CORPORATION

  0 cites
• US123514552025

  Gallium Nitride Particles and Method for Producing Same

  TOSOH CORPORATION

  0 cites
• US122472972025

  Multilayer Film Structure and Method for Producing Same

  National Institute For Materials Science

  0 cites
• US122411472025

  Silicide-based Alloy Material and Device in Which the Silicide-based Alloy Material Is Used

  TOSOH CORPORATION

  0 cites
• US122278302025

  Yttrium Ingot and Sputtering Target in Which the Yttrium Ingot Is Used

  TOSOH CORPORATION

  0 cites
• US121733982024

  Cr—si Sintered Body, Sputtering Target, and Method for Producing Thin Film

  TOSOH CORPORATION

  0 cites
• US118020492023

  Gallium Nitride-based Sintered Compact and Method for Manufacturing Same

  TOSOH CORPORATION

  0 cites