Masako Hatase

8 Patents

• US125776602026

  Compound, Thin-film Forming Raw Material, Thin-film, and Method of Producing Thin-film

  ADEKA CORPORATION

  0 cites
• US125097642025

  Thin-film Forming Raw Material Used in Atomic Layer Deposition Method, and Method of Producing Thin-film

  ADEKA CORPORATION

  0 cites
• US124865732025

  Thin-film Forming Raw Material, Thin-film and Method of Producing Thin-film

  ADEKA CORPORATION

  0 cites
• US122760222025

  Alkoxide Compound, Thin-film Forming Raw Material, and Method of Producing Thin-film

  ADEKA CORPORATION

  0 cites
• US122641682025

  Ruthenium Compound, Thin-film Forming Raw Material, and Method of Producing Thin Film

  ADEKA CORPORATION

  0 cites
• US121042452024

  Compound, Thin-film Forming Raw Material That Contains Said Compound, and Method of Manufacturing Thin Film

  ADEKA CORPORATION

  0 cites
• US117607712023

  Ruthenium Compound, Raw Material for Forming Thin Film, and Method for Producing Thin Film

  ADEKA CORPORATION

  0 cites
• US116239352023

  Raw Material for Forming Thin Film by Atomic Layer Deposition Method, Method of Producing Thin Film, and Alkoxide Compound

  ADEKA CORPORATION

  0 cites