18 Patents
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- US122756932025Onium Salt, Chemically Amplified Resist Composition and Patterning Process
SHIN-ETSU CHEMICAL CO., Ltd.
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- US121642272024Chemically Amplified Negative Resist Composition and Resist Pattern Forming Process
SHIN-ETSU CHEMICAL CO., Ltd.
0 cites - US121642312024Chemically Amplified Positive Resist Composition and Resist Pattern Forming Process
SHIN-ETSU CHEMICAL CO., Ltd.
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- US117098722023Computer-readable Recording Medium Storing Response Processing Program, Response Processing Method, and Information Processing Apparatus
FUJITSU LIMITED
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- US116870002023Sulfonium Compound, Chemically Amplified Resist Composition, and Patterning Process
Shin-etsu Chemical Co., Ltd.
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- US115603552023Onium Salt, Chemically Amplified Resist Composition, and Patterning Process
SHIN-ETSU CHEMICAL CO., Ltd.
0 cites