Patents/Inventors

Masahiro Tabata

MiyagiJP11 patents

11 Patents

US125326832026
Apparatus for Substrate Processing
TOKYO ELECTRON LIMITED
0 cites
US124761152025
Method for Processing Workpiece
TOKYO ELECTRON LIMITED
0 cites
US123259192025
Apparatus for Processing Substrate
TOKYO ELECTRON LIMITED
0 cites
US123082412025
Plasma Processing Method and Plasma Processing Apparatus
TOKYO ELECTRON LIMITED
0 cites
US120515952024
Plasma Processing Method and Plasma Processing Apparatus
TOKYO ELECTRON LIMITED
0 cites
US117354232023
Workpiece Processing Method
TOKYO ELECTRON LIMITED
0 cites
US116580362023
Apparatus for Processing Substrate
TOKYO ELECTRON LIMITED
0 cites
US116370252023
Apparatus for Selectively Etching First Region Made of Silicon Nitride Against Second Region Made of Silicon Oxide
TOKYO ELECTRON LIMITED
0 cites
US115944222023
Film Etching Method for Etching Film
TOKYO ELECTRON LIMITED
0 cites
US115748062023
Film Forming Method
TOKYO ELECTRON LIMITED
0 cites
US115748142023
Substrate and Substrate Processing Method
TOKYO ELECTRON LIMITED
0 cites