27 Patents
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- US122756932025Onium Salt, Chemically Amplified Resist Composition and Patterning Process
SHIN-ETSU CHEMICAL CO., Ltd.
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- US122311102025Electronic Component and Method of Manufacturing Electronic Component
MURATA MANUFACTURING CO., Ltd.
0 cites - US122164012025Sulfonium Salt, Chemically Amplified Resist Composition, and Patterning Process
SHIN-ETSU CHEMICAL CO., Ltd.
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- US120603172024Onium Salt, Chemically Amplified Negative Resist Composition, and Pattern Forming Process
SHIN-ETSU CHEMICAL CO., Ltd.
0 cites - US120422612024Imaging Support Apparatus, Magnetic Resonance Imaging Apparatus, and Imaging Support Method
CANON MEDICAL SYSTEMS CORPORATION
0 cites - US120322892024Polymer, Chemically Amplified Resist Composition and Patterning Process
Shin-etsu Chemical Co., Ltd.
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- US118158142023Iodized Aromatic Carboxylic Acid Type Pendant-containing Polymer, Resist Composition and Patterning Process
SHIN-ETSU CHEMICAL CO., Ltd.
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- US117730592023Onium Salt, Chemically Amplified Negative Resist Composition, and Pattern Forming Process
Shin-etsu Chemical Co., Ltd.
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- US117622872023Onium Salt Compound, Chemically Amplified Resist Composition and Patterning Process
SHIN-ETSU CHEMICAL CO., Ltd.
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- US117037602023Fluorocarboxylic Acid-containing Monomer, Fluorocarboxylic Acid-containing Polymer, Resist Composition and Patterning Process
Shin-etsu Chemical Co., Ltd.
0 cites - US116870002023Sulfonium Compound, Chemically Amplified Resist Composition, and Patterning Process
Shin-etsu Chemical Co., Ltd.
0 cites - US116372322023Acoustic Wave Device Including Li2co3 Layer on Piezoelectric Substrate Made of Linbo3 or Litao3
MURATA MANUFACTURING CO., Ltd.
0 cites - US115603552023Onium Salt, Chemically Amplified Resist Composition, and Patterning Process
SHIN-ETSU CHEMICAL CO., Ltd.
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