Masaaki Kotake

5 Patents

• US124297722025

  Chemically Amplified Resist Composition, Photomask Blank, Method for Forming Resist Pattern, and Method for Producing Polymer Compound

  SHIN-ETSU CHEMICAL CO., Ltd.

  0 cites
• US121642272024

  Chemically Amplified Negative Resist Composition and Resist Pattern Forming Process

  SHIN-ETSU CHEMICAL CO., Ltd.

  0 cites
• US121642312024

  Chemically Amplified Positive Resist Composition and Resist Pattern Forming Process

  SHIN-ETSU CHEMICAL CO., Ltd.

  0 cites
• US118529742023

  Conductive Polymer Composition, Coated Product and Patterning Process

  SHIN-ETSU CHEMICAL CO., Ltd.

  0 cites
• US115488442023

  Monomer, Polymer, Negative Resist Composition, Photomask Blank, and Resist Pattern Forming Process

  SHIN-ETSU CHEMICAL CO., Ltd.

  0 cites