Patents/Inventors

Mark Saly

Santa Clara, CAUS52 patents

42 Patents

US126181532026
Multiple-metal-containing Metal-oxo Photoresist Films by CVD and ALD Methods
Applied Materials, Inc.
0 cites
US126107912026
Method of Forming Carbon-based Spacer for EUV Photoresist Patterns
Applied Materials, Inc.
0 cites
US125989692026
Flexible Monomer for Smooth Polymer Surface
Applied Materials, Inc.
0 cites
US125936292026
Selective Deposition Processes on Semiconductor Substrates
Applied Materials, Inc.
0 cites
US125688032026
Methods of Forming Interconnect Structures
Applied Materials, Inc.
0 cites
US125459982026
Deposition of Rhenium-containing Thin Films
Wayne State University
0 cites
US125435232026
Chlorine-free Removal of Molybdenum Oxides from Substrates
Applied Materials, Inc.
0 cites
US124733162025
Molybdenum (0) Precursors for Deposition of Molybdenum Films
National University Of Singapore
0 cites
US124354112025
Metal Organonitrile Precursors for Thin Film Deposition
Wayne State University
0 cites
US124158242025
Molybdenum(0) Precursors for Deposition of Molybdenum Films
Applied Materials, Inc.
0 cites
US123005032025
Etching of Metal Oxides Using Fluorine and Metal Halides
Applied Materials, Inc.
0 cites
US122917792025
Methods of Selective Atomic Layer Deposition
Applied Materials, Inc.
0 cites
US122813872025
Method of Depositing Metal Films
Applied Materials, Inc.
0 cites
US122813822025
Methods for Depositing Blocking Layers on Conductive Surfaces
Applied Materials, Inc.
0 cites
US122725512025
Selective Metal Removal with Flowable Polymer
Applied Materials, Inc.
0 cites
US122610492025
Selective Etch of a Substrate
Applied Materials , Inc.
0 cites
US121319002024
Methods for Depositing Blocking Layers on Metal Surfaces
Applied Materials, Inc.
0 cites
US121105842024
Low Temperature Growth of Transition Metal Chalcogenides
Applied Materials, Inc.
0 cites
US120947662024
Selective Blocking of Metal Surfaces Using Bifunctional Self-assembled Monolayers
Applied Materials, Inc.
0 cites
US120844642024
Rhenium Complexes and Methods of Use
Wayne State University
0 cites
US120603702024
Molybdenum (0) Precursors for Deposition of Molybdenum Films
Applied Materials, Inc.
0 cites
US120404272024
Preclean and Encapsulation of Microled Features
Applied Materials, Inc.
0 cites
US120312092024
Reducing Agents for Atomic Layer Deposition
Applied Materials, Inc.
0 cites
US120183632024
Gap-fill with Aluminum-containing Films
Applied Materials, Inc.
0 cites
US119903322024
Methods and Apparatus for Deposition of Low-k Films
Applied Materials, Inc.
0 cites
US119729402024
Area Selective Carbon-based Film Deposition
Applied Materials, Inc.
0 cites
US119707772024
Deposition of Low-k Films
Applied Materials, Inc.
0 cites
US119329402024
Silyl Pseudohalides for Silicon Containing Films
APPLIED MATERIALS, Inc.
0 cites
US118916902024
Molybdenum Thin Films by Oxidation-reduction
APPLIED MATERIALS, Inc.
0 cites
US118668242024
Homoleptic Lanthanide Deposition Precursors
Applied Materials, Inc.
0 cites
US118592782024
Molecular Layer Deposition of Amorphous Carbon Films
Applied Materials, Inc.
0 cites
US118482292023
Selective Blocking of Metal Surfaces Using Bifunctional Self-assembled Monolayers
Applied Materials, Inc.
0 cites
US118238932023
Methods of Depositing Sicon with C, O, and N Compositional Control
APPLIED MATERIALS, Inc.
0 cites
US118210852023
Methods of Selective Atomic Layer Deposition
APPLIED MATERIALS, Inc.
0 cites
US117607682023
Molybdenum(0) Precursors for Deposition of Molybdenum Films
Applied Materials, Inc.
0 cites
US117323562023
Multilayer Encapsulation Stacks by Atomic Layer Deposition
Applied Materials, Inc.
0 cites
US117027332023
Methods for Depositing Blocking Layers on Conductive Surfaces
Applied Materials, Inc.
0 cites
US116978792023
Methods for Depositing Sacrificial Coatings on Aerospace Components
APPLIED MATERIALS, Inc.
0 cites
US116037672023
Methods of Protecting Metallic Components Against Corrosion Using Chromium-containing Thin Films
APPLIED MATERIALS, Inc.
0 cites
US115608042023
Methods for Depositing Coatings on Aerospace Components
APPLIED MATERIALS, Inc.
0 cites
US115491812023
Methods for Atomic Layer Deposition of Sico(n) Using Halogenated Silylamides
Applied Materials, Inc.
0 cites
US115453542023
Molecular Layer Deposition Method and System
National University Of Singapore
0 cites