16 Patents
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- US122042542025Multi-layered Moiré Targets and Methods for Using the Same in Measuring Misregistration of Semiconductor Devices
KLA CORPORATION
0 cites - US121054332024Imaging Overlay Targets Using Moiré Elements and Rotational Symmetry Arrangements
KLA Corporation
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- US120558592024Overlay Mark Design for Electron Beam Overlay0 cites
- US120136342024Reduction or Elimination of Pattern Placement Error in Metrology Measurements
KLA-TENCOR CORPORATION
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- US118625242024Overlay Mark Design for Electron Beam Overlay0 cites
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- US117200312023Overlay Design for Electron Beam and Scatterometry Overlay Measurements
KLA Corporation
0 cites - US117037672023Overlay Mark Design for Electron Beam Overlay0 cites
- US116865762023Metrology Target for One-dimensional Measurement of Periodic Misregistration
KLA Corporation
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