Patents/Inventors

Maolin Long

Santa Clara, CAUS45 patents

34 Patents

US126205662026
RF Reference Measuring Circuit for a Direct Drive System Supplying Power to Generate Plasma in a Substrate Processing System
Lam Research Corporation
0 cites
US126032562026
Conductive Member for Cleaning Focus Ring of a Plasma Processing Apparatus
Mattson Technology, Inc.
0 cites
US125801572026
Grid Assembly for Plasma Processing Apparatus
Mattson Technology, Inc.
0 cites
US125073382025
Matchless Plasma Source for Semiconductor Wafer Fabrication
Lam Research Corporation
0 cites
US124903702025
Matchless Plasma Source for Semiconductor Wafer Fabrication
Lam Research Corporation
0 cites
US124841392025
Matchless Plasma Source for Semiconductor Wafer Fabrication
Lam Research Corporation
0 cites
US124760772025
Induction Coil Assembly for Plasma Processing Apparatus
Mattson Technology, Inc.
0 cites
US124712022025
Matchless Plasma Source for Semiconductor Wafer Fabrication
Lam Research Corporation
0 cites
US124379662025
Systems and Methods for Reverse Pulsing
Lam Research Corporation
0 cites
US124244102025
RF Pulsing Within Pulsing for Semiconductor RF Plasma Processing
Lam Research Corporation
0 cites
US124179002025
Plasma Processing Apparatus
Mattson Technology, Inc.
0 cites
US124008312025
Dual Frequency Matching Circuit for Inductively Coupled Plasma (ICP) Loads
Mattson Technology, Inc.
0 cites
US123476612025
Pressure Control System for a Multi-head Processing Chamber of a Plasma Processing Apparatus
Mattson Technology, Inc.
0 cites
US123409812025
Workpiece Processing Apparatus with Outer Gas Channel Insert
Mattson Technology, Inc.
0 cites
US123343122025
Configurable Faraday Shield
Mattson Technology, Inc.
0 cites
US123225792025
Metal Contamination Reduction in Substrate Processing Systems with Transformer Coupled Plasma
Lam Research Corporation
0 cites
US122834672025
Plasma Strip Tool with Movable Insert
Mattson Technology, Inc.
0 cites
US122834632025
Systems and Methods for Multi-level Pulsing in RF Plasma Tools
Lam Research Corporation
0 cites
US122665032025
Hybrid Plasma Source Array
Mattson Technology, Inc.
0 cites
US122610732025
Electrostatic Chuck Assembly for Plasma Processing Apparatus
Mattson Technology, Inc.
0 cites
US122610292025
Protection System for Switches in Direct Drive Circuits of Substrate Processing Systems
Lam Research Corporation
0 cites
US121931382025
Matchless Plasma Source for Semiconductor Wafer Fabrication
Lam Research Corporation
0 cites
US121658412024
Dual-frequency, Direct-drive Inductively Coupled Plasma Source
Lam Research Corporation
0 cites
US121597702024
Cooled Shield for ICP Source
Mattson Technology, Inc.
0 cites
US121192542024
Electrostatic Chuck Assembly for Plasma Processing Apparatus
Mattson Technology, Inc.
0 cites
US121069472024
RF Reference Measuring Circuit for a Direct Drive System Supplying Power to Generate Plasma in a Substrate Processing System
Lam Research Corporation
0 cites
US120401592024
Dual Frequency Matching Circuit for Inductively Coupled Plasma (ICP) Loads
Mattson Technology, Inc.
0 cites
US120091842024
Lift Pin Assembly for a Plasma Processing Apparatus
Mattson Technology, Inc.
0 cites
US120027012024
Electrostatic Chuck Assembly for Plasma Processing Apparatus
Beijing E-town Semiconductor Technology Co., Ltd.
0 cites
US118374932023
Electrostatic Chuck Assembly for Plasma Processing Apparatus
Mattson Technology, Inc.
0 cites
US117987852023
Systems for Reverse Pulsing
Lam Research Corporation
0 cites
US117281362023
RF Pulsing Within Pulsing for Semiconductor RF Plasma Processing
Lam Research Corporation
0 cites
US117281372023
Direct Frequency Tuning for Matchless Plasma Source in Substrate Processing Systems
Lam Research Corporation
0 cites
US117168052023
Matchless Plasma Source for Semiconductor Wafer Fabrication
Lam Research Corporation
0 cites