7 Patents
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- US123325702025Lithographic System Provided with a Deflection Apparatus for Changing a Trajectory of Particulate Debris
ASML Netherlands B.V.
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- US121587062024Lithographic Apparatus and Method with Improved Contaminant Particle Capture
ASML NETHERLANDS B.V.
0 cites - US121050392024Systems and Methods for In-situ Measurement of Sheet Resistance on Substrates
Lam Research Corporation
0 cites - US119069072024Apparatus and Method for Determining a Condition Associated with a Pellicle
ASML HOLDING N.V.
0 cites - US116211872023Systems and Methods for Controlling Substrate Approach Toward a Target Horizontal Plane
Lam Research Corporation
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