10 Patents
- US125710982026Apparatus and Method for Performing Film Forming Process on Substrates in Substrate Processing Chambers
Tokyo Electron Limited
0 cites - 0 cites
- US123851362025Apparatus for Performing Film Forming Process on Substrate, and Method of Exhausting Processing Gas from Apparatus for Performing Film Forming Process on Substrate
Tokyo Electron Limited
0 cites - 0 cites
- 0 cites
- US122472872025Apparatus for Performing Film Forming Process on Substrate and Method of Using Vacuum Chuck Mechanism Provided in the Apparatus
Tokyo Electron Limited
0 cites - 0 cites
- 0 cites
- US117027472023Rotation Driving Mechanism and Rotation Driving Method, and Substrate Processing Apparatus and Substrate Processing Method Using Same
Tokyo Electron Limited
0 cites - 0 cites