Makoto Muramatsu

5 Patents

• US123745512025

  Substrate Treatment Method and Substrate Treatment System

  Tokyo Electron Limited

  0 cites
• US118238972023

  Method for Forming Insulating Film, Apparatus for Processing Substrate, and System for Processing Substrate

  TOKYO ELECTRON LIMITED

  0 cites
• US116933192023

  Substrate Processing Method, Substrate Processing Apparatus, and Storage Medium

  TOKYO ELECTRON LIMITED

  0 cites
• US116315812023

  Insulating Film Forming Method, Insulating Film Forming Device, and Substrate Processing System

  TOKYO ELECTRON LIMITED

  0 cites
• US115748122023

  Computer Storage Medium to Perform a Substrate Treatment Method Using a Block Copolymer Containing a Hydrophilic and Hydrophobic Copolymers

  Tokyo Electron Limited

  0 cites