Li-wei Chou

7 Patents

• US124396572025

  Confined Source/drain Epitaxy Regions and Method Forming Same

  Taiwan Semiconductor Manufacturing Company, Ltd.

  0 cites
• US123639932025

  Semiconductor Device Having Merged Epitaxial Features with Arc-like Bottom Surface and Method of Making the Same

  TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.

  0 cites
• US122914792025

  Textured Glass Articles and Methods of Making the Same

  CORNING INCORPORATED

  0 cites
• US121425602024

  Semiconductor Packages and Methods of Forming Same

  TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.

  0 cites
• US119489712024

  Confined Source/drain Epitaxy Regions and Method Forming Same

  Taiwan Semiconductor Manufacturing Company, Ltd.

  0 cites
• US119087422024

  Semiconductor Device Having Merged Epitaxial Features with Arc-like Bottom Surface and Method of Making the Same

  TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.

  0 cites
• US117697712023

  Finfet Device Having Flat-top Epitaxial Features and Method of Making the Same

  Taiwan Semiconductor Manufacturing Co., Ltd.

  0 cites