Li-chi Yu

5 Patents

• US123242082025

  Method for Manufacturing Semiconductor Device Including Annealing Treatment of Inner Spacer Layer

  Taiwan Semiconductor Manufacturing Co., Ltd.

  0 cites
• US122665742025

  Flowable Chemical Vapor Deposition (FCVD) Using Multi-step Anneal Treatment and Devices Thereof

  Taiwan Semiconductor Manufacturing Co., Ltd.

  0 cites
• US120403822024

  Method of Forming a Nano-fet Semiconductor Device

  TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.

  0 cites
• US119234322024

  Semiconductor Device and Method

  Taiwan Semiconductor Manufacturing Co., Ltd.

  0 cites
• US115455592023

  Semiconductor Device and Method

  TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.

  0 cites