14 Patents
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- US124566112025Systems and Methods for Controlling a Voltage Waveform at a Substrate During Plasma Processing
APPLIED MATERIALS, Inc.
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- US122371482025Plasma Processing Assembly Using Pulsed-voltage and Radio-frequency Power
Applied Materials, Inc.
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- US119487802024Automatic Electrostatic Chuck Bias Compensation During Plasma Processing
Applied Materials, Inc.
0 cites - 0 cites
- US118481762023Plasma Processing Using Pulsed-voltage and Radio-frequency Power
Applied Materials, Inc.
0 cites - US117911382023Automatic Electrostatic Chuck Bias Compensation During Plasma Processing
Applied Materials, Inc.
0 cites - US117767892023Plasma Processing Assembly Using Pulsed-voltage and Radio-frequency Power
Applied Materials, Inc.
0 cites - 0 cites
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